← Capabilities
Critical Technology

Semiconductor Design & EDA

The capacity to design leading-edge semiconductors and to command the design layer itself, electronic design automation, intellectual-property cores and verification, on which all design depends. One of the capabilities of Semiconductors & Advanced Computing.

International families
9,0702015 to 2024
Leading country
United States1.2× the next
All families
36khome filings included
Over five years
Rising2020 to 2024 against the five before

Year by year

Patent families by country of origin and the year of the earliest filing, 2000 to 2025; 2025 is a part year, still filling in. International families are those for which protection was sought beyond one country.

Volume

International patent families in the capability, by the year of the earliest filing.

Source: Global Institute for National Capability (GINC), 2026. Underlying patents from 107 patent offices, IFI CLAIMS and Google

Share by country

Each country's share of the year's international families, in per cent: the capability's five largest countries of origin, 2015 to 2024, and the rest of the world.

Source: Global Institute for National Capability (GINC), 2026. Underlying patents from 107 patent offices, IFI CLAIMS and Google

Country leaderboard

International patent families, 2015 to 2024, by country of origin. Growth compares the latest five full years with the five before.

Ten largest

United States

Taiwan

China

South Korea

Japan

Germany

United Kingdom

Netherlands

France

Israel

2,117

1,739

1,459

1,379

1,123

307

180

145

128

53

2000 to 2025
1United States2,11723.3%1.4×
5,913
2Taiwan1,73919.2%1.2×
2,214
3China1,45916.1%2.6×
22,131
4South Korea1,37915.2%1.7×
1,952
5Japan1,12312.4%1.0×
1,461
6Germany3073.4%1.4×
430
7United Kingdom1802.0%1.0×
271
8Netherlands1451.6%0.6×
155
9France1281.4%0.6×
149
10Israel530.6%1.4×
96
11Switzerland520.6%3.0×
64
12Singapore510.6%1.8×
82
13Belgium490.5%2.1×
55
14Austria420.5%1.5×
45
15Canada390.4%1.6×
75
16Cayman Islands320.4%0.1×
163
17Italy240.3%0.5×
29
18India240.3%1.4×
67
19Sweden140.2%0.8×
16
20Finland140.2%0.8×
18
21Ireland100.1%1.5×
14
22Australia90.1%1.3×
10
23Hong Kong70.1%0.2×
10
24Malaysia70.1%6.0×
11
25Spain60.1%1.0×
7
26Portugal60.1%0.5×
6
27Türkiye50.1%1.5×
7
28Norway50.1%–
8
29Saudi Arabia50.1%0.3×
14
30Russia30.0%2.0×
13
31Denmark20.0%1.0×
2
32Brazil20.0%1.0×
6
33Poland20.0%–
3
34Czechia20.0%1.0×
5
35Hungary20.0%1.0×
2
36New Zealand10.0%0.0×
1
37South Africa10.0%–
1
38Mexico00.0%–
1

Applicants

The largest applicants by international patent families, 2015 to 2024: across the world, then within each of the five countries with the most families in Semiconductor Design & EDA. Names are as held in the source and are not consolidated across subsidiaries.

Global

9,070 international families

TAIWAN SEMICONDUCTOR MFG CO LTD · Taiwan

SAMSUNG ELECTRONICS CO LTD · South Korea

TAIWAN SEMICONDUCTOR MFG · Taiwan

INTEL CORP · United States

SYNOPSYS INC · United States

QUALCOMM INC · United States

1,190

1,068

520

254

191

178

United States

2,117 international families

INTEL CORP

SYNOPSYS INC

QUALCOMM INC

IBM

SIEMENS IND SOFTWARE INC

MICRON TECHNOLOGY INC

252

190

178

146

90

76

Taiwan

1,739 international families

TAIWAN SEMICONDUCTOR MFG CO LTD

TAIWAN SEMICONDUCTOR MFG

UNITED MICROELECTRONICS CORP

REALTEK SEMICONDUCTOR CORP

MEDIATEK INC

TAIWAN INTEGRATED CIRCUIT MFG SHARE LIMITED COMPANY

1,175

518

137

80

54

35

China

1,459 international families

CHANGXIN MEMORY TECH INC

HUAWEI TECH CO LTD

BOE TECHNOLOGY GROUP CO LTD

SEMICONDUCTOR MFG INT SHANGHAI CORP

VAYO SHANGHAI TECH CO LTD

SEMICONDUCTOR MFG INT BEIJING CORP

148

97

38

35

29

27

South Korea

1,379 international families

SAMSUNG ELECTRONICS CO LTD

SK HYNIX INC

SAMSUNG DISPLAY CO LTD

SAMSUNG ELECTRONIC JOINT BASED CONSULTATION

SEOUL NAT UNIV R&DB FOUNDATION

ELECTRONICS & TELECOMMUNICATIONS RES INST

1,066

75

31

26

14

11

Japan

1,123 international families

FUJITSU LTD

SOCIONEXT INC

MITSUBISHI ELECTRIC CORP

RENESAS ELECTRONICS CORP

TOSHIBA KK

TOSHIBA CORP

131

131

84

81

60

59

Similar capabilities

The nine capabilities that share the most international patent families with Semiconductor Design & EDA, 2015 to 2024: the families counted in both as a share of those counted in either. Each card shows its five largest countries.

Critical Technology

Advanced Semiconductor Fabrication

2.8% shared · 4,003 families in both

Japan

United States

South Korea

Taiwan

China

44,951

23,299

22,064

19,873

15,776

Critical Technology

High-Performance & AI Computing

1.6% shared · 478 families in both

United States

China

South Korea

Japan

United Kingdom

8,142

3,957

2,955

2,347

895

Critical Technology

Advanced Packaging & Heterogeneous Integration

1.5% shared · 1,398 families in both

Japan

South Korea

United States

Taiwan

China

24,716

15,416

12,420

11,991

9,796

Critical Technology

Quantum Computing

1.2% shared · 177 families in both

United States

Japan

China

Germany

France

2,335

791

484

336

322

Critical Technology

Compound & Power Semiconductors

1.2% shared · 340 families in both

Japan

Taiwan

United States

China

South Korea

7,085

3,005

2,833

2,353

1,705

Critical Technology

Nanomaterials & Metamaterials

0.9% shared · 312 families in both

United States

South Korea

China

Japan

Taiwan

6,721

3,882

3,587

3,507

2,242

Critical Technology

Semiconductor Equipment & Materials

0.8% shared · 832 families in both

Japan

United States

South Korea

China

Taiwan

37,853

15,529

13,584

8,665

6,232

Critical Technology

Machine Learning & Foundation Models

0.6% shared · 721 families in both

United States

China

South Korea

Japan

Germany

32,358

20,768

15,108

13,257

5,948

Strategic Infrastructure

Production Systems

0.6% shared · 2,220 families in both

Japan

United States

China

Germany

South Korea

106,439

60,107

40,792

37,205

32,878

Crosswalk

How Semiconductor Design & EDA is matched to the patent classifications. The entries below were chosen for it; each stands for itself and everything beneath it in the scheme, 98 Cooperative entries in all. A patent family counts when any of its codes, in either scheme and at any office, falls under one of them. Codes since retired are placed under the entries that replaced them.

EntryTitle in the schemeWhy it is chosenCPC codesIPC codesDocuments
G06F30/30Circuit designCircuit design automation: logic, layout, verification2828213,917
G06F2115/00Details relating to the type of the circuitCircuit types addressed by design automation7none10,135
G06F2117/00Details relating to the type or aim of the circuit designAims of circuit design, e.g. low power, testability7none3,676
H10D89/10Integrated device layoutsIntegrated circuit layouts2144,217
H10D84/90Masterslice integrated circuitsGate arrays and standard-cell integrated circuits51126,322

CPC and IPC codes are the codes in use on patent documents, at any office, that fall under the entry. Documents is the larger of the two schemes' counts of documents carrying one of them. An entry with no IPC codes can be told apart only in the Cooperative scheme.

The Cooperative codes in use that count towards Semiconductor Design & EDA: 95 codes on 298,267 documents. The full crosswalk is in the cpc-to-capability.csv download.

CodeTitleUnder entryHow placedDocuments
H10D89/10Integrated device layoutsH10D89/10In the scheme42,780
G06F30/398Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]G06F30/30In the scheme30,272
G06F30/392Floor-planning or layout, e.g. partitioning or placementG06F30/30In the scheme25,374
G06F30/367Design verification, e.g. using simulation, simulation program with integrated circuit emphasis [SPICE], direct methods or relaxation methodsG06F30/30In the scheme23,767
G06F30/39Circuit design at the physical levelG06F30/30In the scheme18,195
G06F30/30Circuit designG06F30/30In the scheme15,797
G06F30/394RoutingG06F30/30In the scheme15,149
G06F30/33Design verification, e.g. functional simulation or model checkingG06F30/30In the scheme14,320
G06F30/327Logic synthesis; Behaviour synthesis, e.g. mapping logic, HDL to netlist, high-level language to RTL or netlistG06F30/30In the scheme11,300
H10D84/907CMOS gate arraysH10D84/90In the scheme8,215
G06F30/34Circuit design for reconfigurable circuits, e.g. field programmable gate arrays [FPGA] or programmable logic devices [PLD]G06F30/30In the scheme7,970
G06F30/3308Design verification, e.g. functional simulation or model checking using simulationG06F30/30In the scheme6,823
G06F30/3312Timing analysisG06F30/30In the scheme6,572
G06F30/3323Design verification, e.g. functional simulation or model checking using formal methods, e.g. equivalence checking or property checkingG06F30/30In the scheme5,124
G06F30/331Design verification, e.g. functional simulation or model checking using simulation with hardware acceleration, e.g. by using field programmable gate array [FPGA] or emulationG06F30/30In the scheme4,127
G06F30/36Circuit design at the analogue levelG06F30/30In the scheme3,830
G06F2115/12Printed circuit boards [PCB] or multi-chip modules [MCM]G06F2115/00In the scheme3,722
G06F30/337Design optimisationG06F30/30In the scheme3,102
G06F30/347Physical level, e.g. placement or routingG06F30/30In the scheme2,602
G06F30/373Design optimisationG06F30/30In the scheme2,573
G06F30/396Clock treesG06F30/30In the scheme2,502
G06F30/31Design entry, e.g. editors specifically adapted for circuit designG06F30/30In the scheme2,432
H10D84/90Masterslice integrated circuitsH10D84/90In the scheme2,345
G06F2115/02System on chip [SoC] designG06F2115/00In the scheme2,313
G06F30/333Design for testability [DFT], e.g. scan chain or built-in self-test [BIST]G06F30/30In the scheme2,304
H10D84/975Wiring regions or routingH10D84/90In the scheme2,175
G06F30/343Logical levelG06F30/30In the scheme2,055
H10D84/903Masterslice integrated circuits comprising field effect technologyH10D84/90In the scheme1,972
H10D84/998Input and output buffer/driver structuresH10D84/90In the scheme1,865
G06F2115/08Intellectual property [IP] blocks or IP coresG06F2115/00In the scheme1,737
H10D84/981Power supply linesH10D84/90In the scheme1,719
G06F30/3315Design verification, e.g. functional simulation or model checking using static timing analysis [STA]G06F30/30In the scheme1,606
G06F30/32Circuit design at the digital levelG06F30/30In the scheme1,444
H10D89/105Integrated device layouts adapted for thermal considerationsH10D89/10In the scheme1,437
G06F2117/08HW-SW co-design, e.g. HW-SW partitioningG06F2117/00In the scheme1,333
G06F30/3953Routing detailedG06F30/30In the scheme1,241
G06F30/323Translation or migration, e.g. logic to logic, hardware description language [HDL] translation or netlist translationG06F30/30In the scheme1,196
G06F2115/06Structured ASICsG06F2115/00In the scheme1,047
G06F30/3947Routing globalG06F30/30In the scheme1,043
G06F2115/10ProcessorsG06F2115/00In the scheme1,030
H10D84/966Gate electrode terminals or contactsH10D84/90In the scheme741
G06F2117/12Sizing, e.g. of transistors or gatesG06F2117/00In the scheme713
G06F2117/04Clock gatingG06F2117/00In the scheme684
H10D84/974Layout specifications, i.e. inner core regionsH10D84/90In the scheme660
G06F30/38Circuit design at the mixed level of analogue and digital signalsG06F30/30In the scheme602
G06F30/35Delay-insensitive circuit design, e.g. asynchronous or self-timedG06F30/30In the scheme595
G06F2117/02Fault tolerance, e.g. for transient fault suppressionG06F2117/00In the scheme537
H10D84/987Three levels of metalH10D84/90In the scheme525
H10D84/979Data lines, e.g. busesH10D84/90In the scheme509
H10D84/901Masterslice integrated circuits comprising bipolar technologyH10D84/90In the scheme494
H10D84/961Substrate and well contactsH10D84/90In the scheme468
H10D84/953Sub-micron technologyH10D84/90In the scheme376
H10D84/988Four or more levels of metalH10D84/90In the scheme362
H10D84/996Masterslice integrated circuits using combined field effect technology and bipolar technologyH10D84/90In the scheme348
H10D84/9124-T CMOS basic cellsH10D84/90In the scheme314
H10D84/931FET isolationH10D84/90In the scheme305
H10D84/962Horizontal or vertical grid line densityH10D84/90In the scheme297
H10D84/964Yield or reliabilityH10D84/90In the scheme291
G06F2115/04Micro electro-mechanical systems [MEMS]G06F2115/00In the scheme268
G06F2117/06Spare resources, e.g. for permanent fault suppressionG06F2117/00In the scheme250
H10D84/938Implementation of memory functionsH10D84/90In the scheme242
H10D84/9145-T CMOS basic cellsH10D84/90In the scheme197
H10D84/955Twin-tub technologyH10D84/90In the scheme196
H10D84/985Two levels of metalH10D84/90In the scheme189
H10D84/991Latch-up preventionH10D84/90In the scheme170
H10D84/929IsolationsH10D84/90In the scheme164
G06F2117/10Buffer insertionG06F2117/00In the scheme149
H10D84/968Macro-architectureH10D84/90In the scheme109
H10D84/992Noise prevention, e.g. preventing crosstalkH10D84/90In the scheme106
H10D84/959Connectability characteristics, i.e. diffusion and polysilicon geometriesH10D84/90In the scheme89
H10D84/983Levels of metallisationH10D84/90In the scheme85
H10D84/937Implementation of digital circuitsH10D84/90In the scheme83
H10D84/951Technology used, i.e. design rulesH10D84/90In the scheme81
H10D84/9166-T CMOS basic cellsH10D84/90In the scheme73
H10D84/9218-T CMOS basic cellsH10D84/90In the scheme67
H10D84/957SOS or SOI technologyH10D84/90In the scheme64
H10D84/925Microarchitecture relative P to N transistor sizes for delay time adaptationH10D84/90In the scheme60
H10D84/922Microarchitecture relative P to N transistor sizesH10D84/90In the scheme51
H10D84/911Basic cell P to N transistor countsH10D84/90In the scheme43
H10D84/924Microarchitecture relative P to N transistor sizes for current drive capabilityH10D84/90In the scheme42
H10D84/948Transmission gatesH10D84/90In the scheme31
H10D84/971Number of core or basic cells in the macro (RAM or ROM)H10D84/90In the scheme31
H10D84/977Avoiding clock-skew or clock-delaysH10D84/90In the scheme29
H10D84/942Resistors and capacitorsH10D84/90In the scheme28
H10D84/935Degree of specialisation for implementing specific functionsH10D84/90In the scheme23
H10D84/927Microarchitecture relative P to N transistor sizes for capacitive loadingH10D84/90In the scheme19
G06F2115/00Details relating to the type of the circuitG06F2115/00In the scheme18
H10D84/972Distribution functions, e.g. sea of gatesH10D84/90In the scheme15
H10D84/9187-T CMOS basic cellsH10D84/90In the scheme12
H10D84/941Implementation of analog circuitsH10D84/90In the scheme11
G06F2117/00Details relating to the type or aim of the circuit designG06F2117/00In the scheme10
H10D84/905A3B5 or A3B6 gate arraysH10D84/90In the scheme9
H10D84/909MicroarchitectureH10D84/90In the scheme9
H10D84/994Radiation hardened circuitsH10D84/90In the scheme8
H10D84/944Hybrid analog or digitalH10D84/90In the scheme5
Match: Direct
The capability is itself a technology or a kind of physical system, and the classification names it. G06F30 dates from 2020 and the earlier G06F17/50 is absent from the scheme, so older design-automation patents are missed; H10D89/10 is thin in IPC. The crosswalk is a first pass that nobody has reviewed.

Other capabilities in Semiconductors & Advanced Computing